Amplitude is present at CLEO 2019

It is with great pleasure that we can tell you of our presence at the 2019 edition of CLEO (Conference on Lasers and Electro-Optics) which starts next 5th May and ends on the 10th. Don’t hesitate to come and see us at Booth 1635 in the Convention Centre of San Jose. Our team of experts present there will welcome you with open arms.

For those interested, we are also giving talks on Monday 6th and Tuesday 7th regarding different subjects linked to ultrafast lasers. Here is the planning of said talks:







Monday 6 May 2019

9:45 – 10:00 AM – Executive Ballroom 210E (Convention Center)

Compact, high-efficiency, ultrafast 2-cycles sources at 1030nm

Presented by Kaikai Zhang Ultrafast laser systems engineer at Amplitude Laser Group


2:30 – 3:00 PM – Executive Ballroom 210E (Convention Center)

Industrial kilowatt femtosecond lasers: potentialities and challenge

Presented by Clemens Hoenninger R&D Director at Amplitude Laser Group


Tuesday 7 May 2019

2:45 – 3:00 PM – Meeting Room 211A/B (Convention Center)

Efficient ablation of silicon with a high power GHz femtosecond laser source

Presented by Eric Mottay CEO at Amplitude Laser Group


5:00 – 5:15 PM – Executive Ballroom 210E (Convention Center)

Latest developments at Amplitude in the frame of the ELI-HU projects. PW laser at high repetition rate

Presented by Franck Falcoz Business Development Manager at Amplitude Laser Group


6:30 – 6:45 PM – Meeting Room 211 A/B

>300-W femtosecond laser with free triggering up to 25 MHz

Presented by Clemens Hoenninger R&D Director at Amplitude Laser Group